Title:
成膜方法、発光装置の作製方法及び成膜装置
Document Type and Number:
Japanese Patent JP4906018
Kind Code:
B2
Abstract:
To provide a film forming apparatus in which an impurity contained in an organic compound is separated to be removed and a film is formed without decreasing the purity of the purified organic compound, whereby a high-purity organic compound is formed. A film forming apparatus of the present invention includes a purifying chamber for purifying an organic compound and a film forming chamber for vapor-depositing the purified organic compound onto a substrate. The organic compound purified by a zone melting method in the purifying chamber can be vapor-deposited onto the substrate provided in the film forming chamber without decreasing the purity thereof, so that a high-purity organic compound layer can be formed.
Inventors:
Shunpei Yamazaki
Takeshi Nishi
Takeshi Nishi
Application Number:
JP2001069422A
Publication Date:
March 28, 2012
Filing Date:
March 12, 2001
Export Citation:
Assignee:
Semiconductor Energy Laboratory Co., Ltd.
International Classes:
C23C14/24; H05B33/10; B05D7/24; C23C14/12; C23C14/56; H01L51/50; H05B3/00
Domestic Patent References:
| JP6124784A | ||||
| JP4168430A | ||||
| JP9279332A | ||||
| JP10092800A | ||||
| JP4083871A | ||||
| JP5182763A |