Title:
ウェハの角度及びファラデーのアラインメント検査機構を有するイオン注入装置
Document Type and Number:
Japanese Patent JP4917705
Kind Code:
B2
Abstract:
A beam/wafer alignment arrangement has a laser and sensor mounted on the scanning magnet. Direct alignment of the wafer relative to the scanning magnet is determined by reflecting the beam in a specular surface on the wafer holder back to the sensor. Correct alignment of the wafer translation direction is also confirmed from any movement of the reflected light spot on the sensor as the wafer holder is translated up and down. A further sensor is mounted on the beam stop to monitor any misalignment of the process chamber to the collimator magnet, and for checking the location of the travelling Faraday.
Inventors:
Robert John Clifford Mitchell
Application Number:
JP2000312406A
Publication Date:
April 18, 2012
Filing Date:
October 12, 2000
Export Citation:
Assignee:
APPLIED MATERIALS,INCORPORATED
International Classes:
C23C14/48; H01J37/317; H01J37/304; H01L21/265
Domestic Patent References:
| JP4209523A | ||||
| JP9293474A | ||||
| JP10040855A | ||||
| JP10134762A | ||||
| JP62222558A | ||||
| JP6072149U | ||||
| JP2001516151A |
Attorney, Agent or Firm:
Sonoda Yoshitaka
Kobayashi Yoshinori
Yoshiki Hasegawa
Yuichi Yamada
Kobayashi Yoshinori
Yoshiki Hasegawa
Yuichi Yamada