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Title:
帯電防止層形成用樹脂組成物および帯電防止フィルム
Document Type and Number:
Japanese Patent JP4993413
Kind Code:
B2
Abstract:

To provide a plastic film having all of an antistatic performance, solvent resistance and blocking resistance and excellent transparency, and to provide a composition for forming an antistatic layer, from which the plastic film can be formed.

The following composition for forming the antistatic layer is used. The composition comprises: (a) a quaternary ammonium salt type cationic polymer compound having active hydrogen in the molecule; (b) at least one kind selected from a group consisting of acrylic resin, polyurethane resin, polyamide resin, polyester resin and polyether resin having active hydrogen in the molecule; (c) polyisocyanate compound; and as necessary, (d) silane-modified epoxy resin; and/or (f) a compound having at least two active hydrogen atoms.

COPYRIGHT: (C)2009,JPO&INPIT


Inventors:
Fukusaki Tomohide
Yamada Seiyoshi
Hiroshi Sawada
Application Number:
JP2007214446A
Publication Date:
August 08, 2012
Filing Date:
August 21, 2007
Export Citation:
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Assignee:
Arakawa Chemical Industry Co., Ltd.
International Classes:
C08K5/29; C08L101/02; C08K5/37; C08L33/04; C08L63/00; C08L77/06; C09K3/16
Domestic Patent References:
JP2007119600A



 
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