Title:
リソグラフィ装置、デバイス製造方法およびリソグラフィ装置内の温度を測定する方法
Document Type and Number:
Japanese Patent JP5199146
Kind Code:
B2
Abstract:
In an embodiment, a lithographic apparatus is arranged to transfer a pattern from a patterning device onto a substrate, wherein the lithographic apparatus includes an air shower and a temperature sensor positioned near the air shower for measuring the temperature of an air stream in the air shower. The temperature sensor is a thermocouple sensor, e.g., of a thermopile arrangement type. The thermocouple sensor includes a plurality of thermocouples in series, wherein a cold junction and a hot junction are provided, the cold junction being connected to a heat sink, and the hot junction being positioned into the air stream of the air shower.
Inventors:
Van Empel, Jaco, Adrien, Rudolph
Sharman, Paulus, Bartholomewus, Johannes
Sharman, Paulus, Bartholomewus, Johannes
Application Number:
JP2009030672A
Publication Date:
May 15, 2013
Filing Date:
February 13, 2009
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
H01L21/027; G03F7/20
Domestic Patent References:
| JP2007129202A | ||||
| JP2006208177A | ||||
| JP2004170078A | ||||
| JP4113237A | ||||
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Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Toshifumi Onuki