Title:
電子ビーム装置
Document Type and Number:
Japanese Patent JP5230197
Kind Code:
B2
Abstract:
An electron beam device has an electron gun for generating an electron beam, an objective lens for focusing the electron beam on an object and at least one detector for detecting electrons emitted by the object or electrons backscattered by the object. Detection of electrons emitted by or backscattered by an object may be simplified and improved using quadrupole devices and certain configurations of these devices provided in the electron beam device.
Inventors:
Esser's, Erik
Benner, Gerd
Drexel, Volker
Benner, Gerd
Drexel, Volker
Application Number:
JP2007524240A
Publication Date:
July 10, 2013
Filing Date:
July 28, 2005
Export Citation:
Assignee:
Carl Zeiss Microscopy GmbH
International Classes:
H01J37/28; H01J37/12; H01J37/244
Domestic Patent References:
| JP2000048752A | ||||
| JP5325867A | ||||
| JP2001015055A |
Attorney, Agent or Firm:
Kenji Sugimura
Tatsuya Sawada
Groundwork Kenichi
Kazuyuki Tomita
Tatsuya Sawada
Groundwork Kenichi
Kazuyuki Tomita