Title:
制御された固体モルフォロジを利用する、固体前駆体に基づいた流体の送出
Document Type and Number:
Japanese Patent JP5266227
Kind Code:
B2
Abstract:
Apparatus and method for volatilizing a source reagent susceptible to particle generation or presence of particles in the corresponding source reagent vapor, in which such particle generation or presence is suppressed by structural or processing features of the vapor generation system. Such apparatus and method are applicable to liquid and solid source reagents, particularly solid source reagents such as metal halides, e.g., hafnium chloride. The source reagent in one specific implementation is constituted by a porous monolithic bulk form of the source reagent material. The apparatus and method of the invention are usefully employed to provide source reagent vapor for applications such as atomic layer deposition (ALD) and ion implantation.
Inventors:
Cleary, John, M.
Arno, Jose, Ai.
Hendricks, Bryan, Sea.
Knight, don
Battle, scott
Greg, John
Wood Jenski, Michael, Jay.
Sue, Jeong Yuin
Arno, Jose, Ai.
Hendricks, Bryan, Sea.
Knight, don
Battle, scott
Greg, John
Wood Jenski, Michael, Jay.
Sue, Jeong Yuin
Application Number:
JP2009526948A
Publication Date:
August 21, 2013
Filing Date:
August 31, 2007
Export Citation:
Assignee:
Advanced Technology Materials, Inc.
International Classes:
C23C16/448; H01L21/205
Domestic Patent References:
| JP5098445A | ||||
| JP2107593A | ||||
| JP2006503178A | ||||
| JP1083073U |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Toshifumi Onuki