Title:
バリヤ層、成膜方法及び処理システム
Document Type and Number:
Japanese Patent JP5487748
Kind Code:
B2
Abstract:
A processing system for forming a film on a target object having thereon an insulating layer that is made of a low-k film and having a recess is provided. The processing system comprises: a processing apparatus configured to form a first-metal-containing film containing a first metal on a surface of the target object; a processing apparatus configured to form a second-metal-containing film containing Mn as a second metal having a barrier property against a filling metal to be filled in the recess; a processing apparatus configured to form a thin film made of a third metal as the filling metal to be filled; a common transfer chamber connected with each of the processing apparatuses; a transfer unit for transferring the target object into each of the processing apparatuses; and a system controller that controls the whole processing system so as to perform a film forming method.
Inventors:
Miyoshi Hidenori
Application Number:
JP2009142964A
Publication Date:
May 07, 2014
Filing Date:
June 16, 2009
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
C23C16/06; H01L21/285; H01L21/3205; H01L21/768; H01L23/532
Domestic Patent References:
| JP2008205177A | ||||
| JP2009111156A | ||||
| JP2008013848A | ||||
| JP2008218659A |
Foreign References:
| WO2008015912A1 | ||||
| US20090218693 |
Attorney, Agent or Firm:
Akihiro Asai
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