Title:
露光装置、それを用いたデバイスの製造方法、並びに気体供給装置
Document Type and Number:
Japanese Patent JP5574799
Kind Code:
B2
Abstract:
The exposure apparatus (1) includes a purge member (30) that includes a humidifier (34); a first regulator (33a) that regulates a flow rate of first gas which passes through the humidifier (34); and a second regulator (33b) that regulates a flow rate of second gas which does not pass through the humidifier (34). A controller (46) controls the first and the second regulators (33a, 33b) to adjust a flow rate ratio of the first gas and the second gas on the basis of the humidity of the humidified gas and a pre-set target humidity, and controls a variable instrument (38, 39) to keep the flow rate of the first gas passing through the humidifier (34) constant on the basis of an amount of operation of the first regulator (33a) and an amount of the pre-set target operation.
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Inventors:
Naoki Yamaguchi
Matsumura 佑平
Matsumura 佑平
Application Number:
JP2010099996A
Publication Date:
August 20, 2014
Filing Date:
April 23, 2010
Export Citation:
Assignee:
Canon, Inc.
International Classes:
H01L21/027; G03F7/20
Attorney, Agent or Firm:
Ryoichi Takaoka