Title:
水溶性酸化剤を用いた炭化ケイ素の研磨方法
Document Type and Number:
Japanese Patent JP5592276
Kind Code:
B2
Abstract:
The inventive method comprises chemically-mechanically polishing a substrate comprising at least one layer of silicon carbide with a polishing composition comprising a liquid carrier, an abrasive, and an oxidizing agent.
Inventors:
A white, Michael
Jones, Ramon
Jiri Land, Jeffrey
モーゲンボーグ, a cabin
Jones, Ramon
Jiri Land, Jeffrey
モーゲンボーグ, a cabin
Application Number:
JP2010549645A
Publication Date:
September 17, 2014
Filing Date:
March 02, 2009
Export Citation:
Assignee:
Cabot Microelectronics Condominium ration
International Classes:
H01L21/304; B24B37/00; C09K3/14
Attorney, Agent or Firm:
Aoki 篤
Ishida 敬
Tetsuji Koga
Satoru Ideno
Nobuo Sekine
Ishida 敬
Tetsuji Koga
Satoru Ideno
Nobuo Sekine
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