Title:
位相反転ブランクマスク及びその製造方法
Document Type and Number:
Japanese Patent JP5670502
Kind Code:
B2
Abstract:
Provided is a phase-shift blankmask in which a phase-shift layer is formed in at least two continuous layers or a multi-layer film and an uppermost phase-shift layer included in the phase-shift layer is thinly formed to contain a small amount of oxygen (O) so as to enhance chemical resistance and durability thereof. Accordingly, a phase-shift blankmask including the phase-shift layer having enhanced chemical resistance and durability with respect to a cleaning solution containing acid and basic materials, hot deionized water, or ozone water, which is used in a cleaning process that is repeatedly performed during manufacture of a photomask, may be provided using the uppermost phase-shift layer having the enhanced chemical resistance and durability. Furthermore, degradation in the refractive index and degree of phase shift of the phase-shift layer, caused when the cleaning process is repeatedly performed may be prevented due to the uppermost phase-shift layer having the enhanced chemical resistance and durability. Accordingly, a phase-shift blankmask including a thin phase-shift layer can be provided.
Inventors:
南 基 守
姜 亘 遠
金 東 建
張 種 ▲うぉん▼
崔 ▲みん▼ 箕
姜 亘 遠
金 東 建
張 種 ▲うぉん▼
崔 ▲みん▼ 箕
Application Number:
JP2013060778A
Publication Date:
February 18, 2015
Filing Date:
March 22, 2013
Export Citation:
Assignee:
株式会社エスアンドエス テック
International Classes:
G03F1/26; G03F7/20; H01L21/027
Attorney, Agent or Firm:
Tadashige Ito
Tadahiko Ito
Shinsuke Onuki
Tadahiko Ito
Shinsuke Onuki