Title:
光活性化合物およびこれを含む感光性樹脂組成物
Document Type and Number:
Japanese Patent JP5713477
Kind Code:
B2
Abstract:
The present invention relates to a photoactive compound having a novel structure and a photosensitive resin composition including the same, and the photoactive compound according to the present invention has excellent sensitivity due to efficient absorption to a UV light source by including a nitro group and a phosphonate structure, and has excellent retention rate, mechanical strength, heat resistance, chemical resistance and developing resistance by improving solubility of the photosensitive resin composition by excellent compatibility of the phosphonate structure and a binder resin. Therefore, the photosensitive resin composition according to the present invention is useful to cure a column spacer, an overcoat, a passivation material and the like of a liquid crystal display device, and is useful in view of a high temperature process property.
Inventors:
Cho, Changho
Chun, Won Jin
Khahabash, riser
Kim, Seung Hyun
Choi, Don Chan
Lee, Saint-Chur
Kim, Han Soo
Heo, Yun Hee
Kim, Sunhwa
Chun, Won Jin
Khahabash, riser
Kim, Seung Hyun
Choi, Don Chan
Lee, Saint-Chur
Kim, Han Soo
Heo, Yun Hee
Kim, Sunhwa
Application Number:
JP2014505096A
Publication Date:
May 07, 2015
Filing Date:
May 14, 2012
Export Citation:
Assignee:
LG HAUSYS,LTD.
International Classes:
C07D209/88; C07F9/40; C08F2/50; C08F265/02; C09B67/20; G02B5/20; G03F7/004; G03F7/027; G03F7/031; G03F7/033; H01L51/50; H05B33/22
Domestic Patent References:
| JP2012514636A | ||||
| JP2014500852A |
Attorney, Agent or Firm:
Longhua International Patent Service Corporation