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Title:
光電変換装置およびその製造方法、光電変換モジュール
Document Type and Number:
Japanese Patent JP5734512
Kind Code:
B2
Abstract:
A photoelectric conversion device includes an n-type semiconductor layer and a p-type semiconductor layer, a collecting electrode formed on the n-type semiconductor layer, and a collecting electrode formed on the p-type semiconductor layer, on a back surface opposite to a light receiving surface of an n-type crystalline silicon substrate, and an n-type semiconductor region on a surface on a light receiving surface side of the n-type crystalline silicon substrate, wherein in the n-type semiconductor region, an n-type semiconductor region that is opposed to the n-type semiconductor layer with the n-type crystalline silicon substrate therebetween and an n-type semiconductor region that is opposed to the p-type semiconductor layer with the n-type crystalline silicon substrate therebetween have different average impurity concentrations.

Inventors:
Hidetada Tokugawa
Takehiko Sato
Application Number:
JP2014515512A
Publication Date:
June 17, 2015
Filing Date:
January 31, 2013
Export Citation:
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Assignee:
Mitsubishi Electric Corporation
International Classes:
H01L31/068; H01L31/0224; H01L31/0352
Domestic Patent References:
JP2010258043A2010-11-11
JP2010147324A2010-07-01
JP2011035092A2011-02-17
JP2005101427A2005-04-14
JP2013125890A2013-06-24
JP2013115262A2013-06-10
JP2013197538A2013-09-30
Attorney, Agent or Firm:
Hiroaki Sakai