Title:
含フッ素Ｎ−アルキルスルホニルイミド化合物の製造方法およびイオン性化合物の製造方法
Document Type and Number:
Japanese Patent JP5738451
Kind Code:
B2
Abstract:
According to the method for producing fluorine-containing N-alkylsulfonylimide compound, the fluorine-containing N-alkylsulfonylimide compound can be produced safely with a high recovery rate by alkylating fluorine-containing sulfonylimide acid or fluorine-containing sulfonylimide acid salt with dialkylsulfuric acid or dialkylcarbonic acid.
Inventors:
Hiroyuki Yayanagi
Takashi Konishi
Daisuke Takano
Honda Tsunetoshi
Takashi Konishi
Daisuke Takano
Honda Tsunetoshi
Application Number:
JP2014083149A
Publication Date:
June 24, 2015
Filing Date:
April 14, 2014
Export Citation:
Assignee:
Mitsubishi Materials Corporation
Mitsubishi Materials Electronic Chemicals Co., Ltd.
Mitsubishi Materials Electronic Chemicals Co., Ltd.
International Classes:
C07C303/40; C07C311/48; C07D233/58
Domestic Patent References:
| JP2007529477A |
Foreign References:
| WO2000065913A1 |
Other References:
Jie Zhang et al.,Direct methylation and trifluoroethylation of imidazole and pyridine derivatives,Chem. Comm.,2003年,p.2334-2335
Attorney, Agent or Firm:
Masatake Shiga
Mitsuo Teramoto
Yasushi Matsunuma
Fumihiro Hosokawa
Kazunori Onami
Mitsuo Teramoto
Yasushi Matsunuma
Fumihiro Hosokawa
Kazunori Onami