Title:
露光装置
Document Type and Number:
Japanese Patent JP5760293
Kind Code:
B2
Abstract:
A light-exposure device is provided with a microlens array on which is arranged with a prescribed regularity a plurality of microlenses on which exposure light transmitted through a light source and a mask is introduced to resolve an upright equal-magnification image on a substrate. Upon reaching a prescribed position, the substrate is irradiated with pulsed laser light from the light source, and the substrate is successively exposed, and after the entire area of the exposure region of the substrate is exposed, a relative positional relationship between the microlens array and the mask is successively switched in a vertical direction by an amount of a horizontal pitch of the microlenses, and a subsequent exposure is performed. Exposure with high precision and high resolution can thereby be performed with a short exposure cycle time.
Inventors:
Hiroshi Kajiyama
Mizumura Tsushin
Makoto Hatanaka
Mizumura Tsushin
Makoto Hatanaka
Application Number:
JP2011045576A
Publication Date:
August 05, 2015
Filing Date:
March 02, 2011
Export Citation:
Assignee:
Buoy Technology Co., Ltd.
International Classes:
G02B3/00; G03F7/20; G02B13/26
Domestic Patent References:
| JP2008176257A | ||||
| JP2007125841A | ||||
| JP9244255A | ||||
| JP7035698A | ||||
| JP2006142542A |
Attorney, Agent or Firm:
Masanori Fujimaki