Title:
蒸着マスク、フレーム付き蒸着マスク、及び有機半導体素子の製造方法
Document Type and Number:
Japanese Patent JP5780350
Kind Code:
B2
Abstract:
A vapor deposition mask includes a metal mask and a resin mask having an opening. An inner wall surface for composing the opening has an inflection point in a thicknesswise cross section of the resin mask. When an intersection of a first surface, not facing the metal mask, of the resin mask and the inner wall surface is set to be a first intersection, an intersection of a second surface, facing the metal mask, of the resin mask and the inner wall surface is set to be a second intersection, and there is set a first inflection point first positioned from the first intersection toward the second intersection, an angle formed by a line connecting the first intersection and the first inflection point and the first surface is larger than an angle formed by a line connecting the first inflection point and the second intersection and the second surface.
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Inventors:
Toshihiko Takeda
Katsuya Obata
Hiroshi Kawasaki
Katsuya Obata
Hiroshi Kawasaki
Application Number:
JP2014207030A
Publication Date:
September 16, 2015
Filing Date:
October 08, 2014
Export Citation:
Assignee:
Dai Nippon Printing Co.,Ltd.
International Classes:
C23C14/24; H01L51/50; H05B33/10
Domestic Patent References:
| JP11222664A | ||||
| JP2003045657A | ||||
| JP2009041054A | ||||
| JP2009068082A | ||||
| JP5288072B2 |
Attorney, Agent or Firm:
Patent Business Corporation Intect International Patent Office
Yoshinori Ishibashi
Yoshinori Ishibashi
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