Title:
基板処理装置
Document Type and Number:
Japanese Patent JP5819759
Kind Code:
B2
Abstract:
A substrate treating apparatus includes a loading section 1, a treating tank 2, a rinsing tank 4, a drying tank 5, an unloading section 6, and a pair of endless belt members 7 for transporting substrates successively through the loading section 1, treating tank 2, rinsing tank 4, drying tank 5 and unloading section 6. The substrate treating apparatus further includes a fixing mechanism for fixing a pair of side edges of each substrate parallel to a transport direction of the substrate to the endless belt members 7. In the loading section 1, a plurality of substrates are fixed, each with the pair of edges thereof parallel to the transport direction fixed at constant intervals to the pair of endless belt members 7. The substrates having undergone the treatment are removed from the pair of endless belt members 7 in the unloading section 6.
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Inventors:
Yukio Tomifuji
Shigeki Minami
Kazuo Age
Norio Yoshikawa
Shigeki Minami
Kazuo Age
Norio Yoshikawa
Application Number:
JP2012075690A
Publication Date:
November 24, 2015
Filing Date:
March 29, 2012
Export Citation:
Assignee:
Screen Holdings Co., Ltd.
International Classes:
H01L21/677; B65G49/06; H05K3/00; H05K3/06
Domestic Patent References:
| JP2005149817A | ||||
| JP9122982A | ||||
| JP7326650A | ||||
| JP4216700A | ||||
| JP63114998A |
Attorney, Agent or Firm:
Takashi Otsubo
Sachiko Muraguchi
Sachiko Muraguchi
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