複数の広幅イオンビーム用アンテナを有する誘導結合プラズマイオン源 - Varian Semiconductor Equipment Associates, Inc.

Title:

複数の広幅イオンビーム用アンテナを有する誘導結合プラズマイオン源

Document Type and Number:

Japanese Patent JP5832708

Kind Code:

B2

Abstract:

A wide ion beam source includes a plurality of RF windows arranged in a predetermined relationship, a single plasma chamber disposed on a first side of the plurality of RF windows, a plurality of RF antennas, each RF antenna of the plurality of RF antennas disposed on a second side of a respective RF window of the plurality of RF windows, the second side being opposite the first side, and a plurality of RF sources, each RF source coupled to a respective RF antenna of the plurality of RF antennas, wherein a difference in frequency of a first RF signal produced by a first RF source coupled to a first RF antenna from that of a second RF signal produced by a second RF source coupled to an RF antenna adjacent to the first RF antenna is greater than 10 kHz.

Inventors:

Costel Viroiu
Joseph Sea Olson
Edward W. Bell
Manny Sierratsuki

Application Number:

JP2015526691A

Publication Date:

December 16, 2015

Filing Date:

August 08, 2013

Export Citation:

Click for automatic bibliography generation Help