Title:
塗布膜形成装置
Document Type and Number:
Japanese Patent JP5929411
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a coating film forming apparatus capable of suppressing the decline of uniformity of a coating thickness of a coating film for each panel while shortening the time taken for forming the coating film.SOLUTION: A coating film forming apparatus 10 includes: a substrate stage 12 for mounting a substrate 13 in which three panel areas are arranged in a main scanning direction which is one direction; and three nozzles 19a-19c arranged at positions different from each other with respect to the main scanning direction, for discharging a coating liquid toward the substrate stage 13 without a break. In the coating film forming apparatus 10, the positions in the main scanning direction of the respective nozzles 19a-19c are calculated on the basis of the detection result of a position detection part 15, and the respective nozzles 19a-19c are arranged on the mutually different panel areas of the substrate 13.
Inventors:
Tomohiro Kai
Masayuki Otani
Masayuki Otani
Application Number:
JP2012074487A
Publication Date:
June 08, 2016
Filing Date:
March 28, 2012
Export Citation:
Assignee:
Toppan Printing Co., Ltd.
International Classes:
B05C5/00; B05C11/00; B05C13/02
Domestic Patent References:
| JP2008207084A | ||||
| JP2009119395A | ||||
| JP2009517684A |
Foreign References:
| WO2010137403A1 |
Attorney, Agent or Firm:
Hironobu Onda
Makoto Onda
Makoto Onda