Title:
圧送容器、圧送容器を用いた保管方法、及び、圧送容器を用いた移液方法
Document Type and Number:
Japanese Patent JP6375688
Kind Code:
B2
Abstract:
The present invention provides a pressure feed container capable of ensuring the cleanliness of a liquid such as a protective film-forming liquid chemical or a protective film-forming liquid chemical kit for preparing the liquid chemical even after long-term storage, and also capable of suppressing electrostatic charge in the liquid. The present invention provides a pressure feed container configured to store a protective film-forming liquid chemical or a protective film-forming liquid chemical kit that is mixed into the protective film-forming liquid chemical, and to transfer a liquid upon application of pressure to the inside of the container, the protective film-forming liquid chemical being for forming a water-repellent protective film on at least surfaces of recessed portions of an uneven pattern formed on a surface of a wafer containing a silicon element at least at a part of the uneven pattern. The protective film-forming liquid chemical contains a nonaqueous organic solvent, a silylation agent, and an acid or a base; the protective film-forming liquid chemical kit includes a treatment liquid A containing a nonaqueous organic solvent and a silylation agent, and a treatment liquid B containing a nonaqueous organic solvent and an acid or a base; the pressure feed container includes a container body configured to contain a liquid selected from the protective film-forming liquid chemical, the treatment liquid A, and the treatment liquid B, and a liquid flowing nozzle configured such that the liquid flows therethrough to be introduced into the container body and/or to be extracted from the container body; the container body includes a metal can body in which a portion configured to contact the liquid is formed from a resin material; the liquid flowing nozzle is provided with a neutralization mechanism configured to reduce electrostatic potential in the liquid; and a liquid contact portion of the liquid flowing nozzle excluding the neutralization mechanism is formed from a resin material.
Inventors:
Atsushi Ryokawa
Shuhei Yamada
Masahiro Fujitani
Yousuke Hashimoto
Chida Deda
Kumon Soichi
Saito Maki
Takashi Saio
Shuhei Yamada
Masahiro Fujitani
Yousuke Hashimoto
Chida Deda
Kumon Soichi
Saito Maki
Takashi Saio
Application Number:
JP2014098680A
Publication Date:
August 22, 2018
Filing Date:
May 12, 2014
Export Citation:
Assignee:
Central Glass Co., Ltd.
International Classes:
B65D25/14; B65D25/42; C09K3/18
Domestic Patent References:
| JP9266092A | ||||
| JP2011136770A | ||||
| JP2012033880A | ||||
| JP60110688A | ||||
| JP9286490A |
Attorney, Agent or Firm:
Atomi International Patent Office