Title:
投影露光方法、投影露光システム、及び投影対物系
Document Type and Number:
Japanese Patent JP6407193
Kind Code:
B2
Abstract:
A projection exposure method comprises: exposing an exposure area (EA) of a radiation-sensitive substrate (W), arranged in an image surface (IS) of a projection objective (PO), with at least one image of a pattern of a mask (M) arranged in an object surface (OS) of the projection objective in a scanning operation which comprises moving the mask relative to an effective object field of the projection objective and simultaneously moving the substrate relative to an effective image field (IF) of the projection objective in respective scanning directions. The method includes changing imaging properties of the projection objective actively during the scanning operation according to a given time profile to change dynamically at least one aberration of the projection objective between a beginning and an end of the scanning operation.
Inventors:
Dirk Jurgens
Application Number:
JP2016082705A
Publication Date:
October 17, 2018
Filing Date:
April 18, 2016
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
G03F7/20; G02B13/18; G02B13/24; G02B17/08
Domestic Patent References:
| JP2006128699A | ||||
| JP2008233932A | ||||
| JP2008292801A | ||||
| JP2003142373A | ||||
| JP10242048A | ||||
| JP2010187002A | ||||
| JP2014239240A |
Foreign References:
| WO2008019803A1 | ||||
| WO2008034636A2 | ||||
| US20030234918 | ||||
| WO2009013230A1 |
Attorney, Agent or Firm:
Takaki Nishijima
Disciple Maru Ken
Shinichiro Tanaka
Fumiaki Otsuka
Hiroyuki Suda
Hiroshi Uesugi
Naoki Kondo
Yoshinori Kishi
Disciple Maru Ken
Shinichiro Tanaka
Fumiaki Otsuka
Hiroyuki Suda
Hiroshi Uesugi
Naoki Kondo
Yoshinori Kishi