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Title:
含フッ素基修飾ポリシルセスキオキサン液体、含フッ素基修飾ポリシルセスキオキサンガラス及びこれらの製造方法
Document Type and Number:
Japanese Patent JP6411008
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a low-refractive-index, low-dispersion, low-density fluorine-containing group-modified polysilsesquioxane glass excellent in terms of ultraviolet transparency, low-temperature moldability, and heat resistance and capable of forming a thin film; a fluorine-containing group-modified polysilsesquioxane liquid serving as a precursor of the fluorine-containing group-modified polysilsesquioxane glass; and methods for easily manufacturing both.SOLUTION: The provided method for manufacturing a fluorine-containing group-modified polysilsesquioxane glass includes steps of hydrolyzing and poly-condensing a mixture consisting of a fluorine-containing group-modified trifunctional silicon alkoxide, water, and an acid catalyst without using an organic solvent as a co-solvent, removing the alcohol generated as a result of the hydrolysis of the fluorine-containing group-modified trifunctional silicon alkoxide, and performing a heat treatment.

Inventors:
Koichi Kajiwara
Yuko Fukuda
Sakuragi Arata
Kiyoshi Kanamura
Application Number:
JP2013023079A
Publication Date:
October 24, 2018
Filing Date:
February 08, 2013
Export Citation:
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Assignee:
Tokyo Metropolitan University
International Classes:
C08G77/24
Domestic Patent References:
JP2003195072A
JP2005145795A
JP200635624A
JP200939926A
JP200253805A
JP62246828A
JP62100443A
Attorney, Agent or Firm:
Shinjiro Ono
Osamu Yamamoto
Toru Miyamae
Motoharu Nakanishi
Minako Matsuyama