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Title:
配向制御層ポリマー、その製造方法およびそれを含む物品
Document Type and Number:
Japanese Patent JP6434233
Kind Code:
B2
Abstract:
Disclosed herein is a method comprising disposing a first composition comprising a first block copolymer upon a substrate; where the first block copolymer comprises a first segment and a second segment that are covalently bonded to each other and that are chemically different from each other; where the first segment has a first surface free energy and where the second segment has a second surface free energy; and disposing a second composition comprising an second copolymer upon a free surface of the first block copolymer; where the second copolymer comprises a surface free energy reducing moiety; where the surface free energy reducing moiety has a lower surface free energy than the first surface free energy and the second surface free energy; the second copolymer further comprising one or more moieties having an affinity to the first block copolymer; where the surface free energy reducing moiety is chemically different from the first segment and from the second segment.

Inventors:
Peter Trefonas Third
Dayan Wang
Rahul Sharma
Philip Dee Fustad
Minki Lee
Application Number:
JP2014129529A
Publication Date:
December 05, 2018
Filing Date:
June 24, 2014
Export Citation:
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Assignee:
Rohm and Haas Electronic Materials LLC
International Classes:
B05D1/36; B05D7/24; B32B27/00; B82Y30/00; B82Y40/00; H01L21/027
Domestic Patent References:
JP2012066536A
Foreign References:
US20110206905
Other References:
Christopher M.Bates,"Polarity-Switching Top Coats Enable Orientation of Sub-10-nm Block Copolymer Domains",SCIENCE,2012年11月 9日,Vol. 338,pp.775-779,URL,https//doi.org/10.1126/science.1226046
Hiroshi Yoshida, et al.,"Topcoat Approaches for Directed Self-Assembly of Strongly Segregating Block Copolymer Thin Films",Journal of Photopolymer Science and Technology,2013年 5月10日,Vol.26,pp.55-58,URL,https://doi.org/10.2494/photopolymer.26.55
Attorney, Agent or Firm:
Patent Business Corporation Sender International Patent Office