Title:
基板処理方法および基板処理装置
Document Type and Number:
Japanese Patent JP6461748
Kind Code:
B2
Abstract:
A brush is moved from a central position to an outer periphery position while the brush is contacted with an upper surface of a substrate being rotated at a first rotational speed. In this way, a flat region of the substrate is scrub-cleansed. Thereafter, the brush is contacted with a bevel region of the substrate being rotated at a second rotational speed lower than the first rotational speed. In this way, the bevel region of the substrate is scrub-cleansed. Thereafter, while the substrate is rotated at a third rotational speed higher than the second rotational speed, the brush is disposed at an overlapping region cleaning position. In this way, an overlapping region of the flat region and the bevel region are scrub-cleansed.
Inventors:
Itsuki Nakamura
Application Number:
JP2015166099A
Publication Date:
January 30, 2019
Filing Date:
August 25, 2015
Export Citation:
Assignee:
Screen Holdings Co., Ltd.
International Classes:
H01L21/304
Domestic Patent References:
| JP4939376B2 | ||||
| JP2013171918A | ||||
| JP2003151943A | ||||
| JP6045302A | ||||
| JP2002110630A | ||||
| JP2008539594A | ||||
| JP2003197598A |
Attorney, Agent or Firm:
Inaoka cultivation
Mio Kawasaki
Masahide Yasuda
Mio Kawasaki
Masahide Yasuda