Title:
ナノインプリントリソグラフィ用マスクの修正方法およびナノインプリントリソグラフィ用マスクの製造方法
Document Type and Number:
Japanese Patent JP6467862
Kind Code:
B2
Inventors:
Takao Nishiguchi
Yushi Kosuge
Ryugo Hikichi
Sho Hatakeyama
Ryuji Nagai
Satoshi Yusa
Yushi Kosuge
Ryugo Hikichi
Sho Hatakeyama
Ryuji Nagai
Satoshi Yusa
Application Number:
JP2014215131A
Publication Date:
February 13, 2019
Filing Date:
October 22, 2014
Export Citation:
Assignee:
Dai Nippon Printing Co.,Ltd.
International Classes:
H01L21/027; B29C59/02
Domestic Patent References:
| JP2005044843A | ||||
| JP2013228711A | ||||
| JP8328239A | ||||
| JP2004294613A |
Foreign References:
| US20030215721 | ||||
| US6096459 |
Attorney, Agent or Firm:
Akihiko Yamashita
Kishimoto Tatsuto
Kishimoto Tatsuto