Title:
窒化ガリウムおよび金属酸化物の複合基板
Document Type and Number:
Japanese Patent JP6541229
Kind Code:
B2
Abstract:
The present invention discloses a novel composite substrate which solves the problem associated with the quality of substrate surface. The composite substrate has at least two layers comprising the first layer composed of GaxAlyIn1-x-yN (0≰x≰1, 0≰x+y≰1) and the second layer composed of metal oxide wherein the second layer can be removed with in-situ etching at elevated temperature. The metal oxide layer is designed to act as a protective layer of the first layer until the fabrication of devices. The metal oxide layer is designed so that it can be removed in a fabrication reactor of the devices through gas-phase etching by reactive gas such as ammonia.
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Inventors:
Tadaro Hashimoto
Application Number:
JP2015528454A
Publication Date:
July 10, 2019
Filing Date:
February 28, 2013
Export Citation:
Assignee:
Six Point Materials, Inc.
SEOUL SEMICONDUTOR CO., LTD.
SEOUL SEMICONDUTOR CO., LTD.
International Classes:
C30B29/38
Domestic Patent References:
| JP2010042976A | ||||
| JP2004356609A | ||||
| JP2006165069A | ||||
| JP2003277182A | ||||
| JP2011006304A |
Attorney, Agent or Firm:
Hidesaku Yamamoto
Natsuki Morishita
Takatoshi Iida
Daisuke Ishikawa
Kensaku Yamamoto
Natsuki Morishita
Takatoshi Iida
Daisuke Ishikawa
Kensaku Yamamoto