Title:
マイクロリソグラフィ投影露光装置のミラーを位置合わせする方法
Document Type and Number:
Japanese Patent JP6545701
Kind Code:
B2
Abstract:
A method for aligning a mirror of a microlithographic projection exposure apparatus, according to one formulation, involves: recording a first partial interferogram between a wave reflected at a first mirror segment (101) and a reference wave reflected at a reference surface (110, 310, 510), recording a second partial interferogram between a wave reflected at a second mirror segment (102) and a reference wave reflected at the reference surface, determining a phase offset between the first partial interferogram and the second partial interferogram, and aligning the first mirror segment and the second mirror segment in relation to one another in accordance with the determined phase offset, so that the distance of the relevant mirror segments (101, 102) from a respective predetermined, hypothetical surface in the direction of the respective surface normal is less than λ/10 at each point on the mirror segments, where λ denotes the operating wavelength of the mirror.
Inventors:
Rolf Flyman
Bernd Dell Band
Jochen Hetzler
Bernd Dell Band
Jochen Hetzler
Application Number:
JP2016560691A
Publication Date:
July 17, 2019
Filing Date:
March 30, 2015
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
G03F7/20; G02B7/00
Domestic Patent References:
| JP2013543274A | ||||
| JP2008542801A | ||||
| JP2006309243A |
Foreign References:
| WO2014009120A1 | ||||
| US20110001947 |
Attorney, Agent or Firm:
Kenji Sugimura
Groundwork Kenichi
Miyata Kousuke
Groundwork Kenichi
Miyata Kousuke