Title:
高圧ＢＦ３／Ｈ２混合物の製造
Document Type and Number:
Japanese Patent JP6580032
Kind Code:
B2
Abstract:
Methods are described for filling gas mixture supply vessels with constituent gases to achieve precision compositions of the gas mixture, wherein the gas mixture comprises at least two constituent gases. Cascading fill techniques may be employed, involving flowing of gases from single source vessels to multiple target vessels, or from multiple source vessels to a single target vessel. The methods may be employed to form dopant gas mixtures, e.g., of boron trifluoride and hydrogen, for ion implantation applications.
Inventors:
Bill, oreg
Sweeney, Joseph Dee
Sweeney, Joseph Dee
Application Number:
JP2016514091A
Publication Date:
September 25, 2019
Filing Date:
May 15, 2014
Export Citation:
Assignee:
Entegris Incorporated
International Classes:
B01F23/10; C01B17/16; F17C5/06; C01B19/04; C01B21/00; C01B23/00; C01B25/06; C01B32/40; C01B32/50; C01B33/04; C01B33/107; C01B35/02; C01B35/06; C01C1/00; C01G17/04; C01G28/00
Domestic Patent References:
| JP2000337596A | ||||
| JP2003336795A | ||||
| JP2007516396A | ||||
| JP55145521A | ||||
| JP61114199U | ||||
| JP2007537397A | ||||
| JP2009522519A |
Foreign References:
| US20120312418 | ||||
| US20080016884 |
Attorney, Agent or Firm:
Sonoda/Kobayashi Patent Business Corporation