鉛直ガルバニック金属デポジションのための基板ホルダ

Title:

鉛直ガルバニック金属デポジションのための基板ホルダ

Document Type and Number:

Japanese Patent JP6590933

Kind Code:

B2

Abstract:

The present invention is related to a substrate holder for vertical galvanic metal, preferably copper, deposition on a substrate to be treated comprising a first substrate holder part and a second substrate holder part, wherein both substrate holder parts comprise an inner metal comprising part and an outer non-metallic part characterized in that the substrate holder further comprises i) At least one hanging element in each substrate holder part for mechanically connecting the substrate holder to a treatment container, ii) At least one first sealing element in each substrate holder part arranged between the substrate to be treated and the respective substrate holder part, iii) At least one single second sealing element for the entire substrate holder arranged between the inner metal comprising part of the substrate holder and the outer non-metallic part of the substrate holder, iv) At least one fastening system for detachably fastening both substrate holder parts to each other for holding the substrate to be treated, v) At least one first contact element in each substrate holder part for forwarding current from an outer source through the hanging element to the at least second contact element, and vi) At least one second contact element in each substrate holder part for forwarding current from the at least first contact element to the substrate to be treated.

Inventors:

Ernulf Fendel
Ralph Lauen Bush
Tobias Bussenius

Application Number:

JP2017533261A

Publication Date:

October 16, 2019

Filing Date:

December 16, 2015

Export Citation:

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