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Patent Searching and Data


Title:
光電変換装置
Document Type and Number:
Japanese Patent JP6599769
Kind Code:
B2
Abstract:
There is provided a photoelectric conversion device which can prevent the contact resistance between a non-crystalline semiconductor layer containing impurities and an electrode formed on the non-crystalline silicon layer from increasing, and can improve the element characteristics. A photoelectric conversion element (10) includes a silicon substrate (12), a first non-crystalline semiconductor layer (20n), a second non-crystalline semiconductor layer (20p), a first electrode (22n), and a second electrode (22p). One electrode (22n) includes first conductive layers (26n, 26p), and second conductive layers (28n, 28p). The first conductive layers (26n, 26p) have a first metal as a main component. The second conductive layers (28n, 28p) contain a second metal which is more likely to be oxidized than the first metal, are formed to be in contact with the first conductive layers (26n, 26p), and are disposed to be closer to the silicon substrate (12) than the first conductive layers (26n, 26p).

Inventors:
Kenji Kimoto
Koide Naojo
Zhou Yanmin
Masamichi Kobayashi
Application Number:
JP2015543927A
Publication Date:
October 30, 2019
Filing Date:
October 24, 2014
Export Citation:
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Assignee:
Sharp Corporation
International Classes:
H01L31/0224; H01L31/0747
Domestic Patent References:
JP2005101240A
JP2010129872A
JP2012164961A
JP2013513966A
Foreign References:
US20130269771
WO2013030993A1
WO2009154137A1
WO2011077963A1
Attorney, Agent or Firm:
Kawakami Keiko
Takao Matsuyama