Title:
多層膜構造体の製造方法
Document Type and Number:
Japanese Patent JP6661808
Kind Code:
B2
Abstract:
To provide a production of a multilayer film structure, which is enabled to acquire excellent characteristics by suppressing the oxidation of a metal film.SOLUTION: A metal film is formed by using a first metal target, and a first dielectric film is formed on the metal film by feeding an inert gas by means of a second metal containing target having an activated surface. After this, a second dielectric film is formed over the first dielectric film by the supply of a reactive gas. A sputtering target having an activated surface is used to form a dielectric film in a metal mode over a metal film 1 so that the oxidation of the metal film 1 can be suppressed.SELECTED DRAWING: Figure 1
Inventors:
Toshiaki Sugawara
Application Number:
JP2019021094A
Publication Date:
March 11, 2020
Filing Date:
February 07, 2019
Export Citation:
Assignee:
Dexerials Co., Ltd.
International Classes:
C23C14/34; B32B9/00; B32B15/04; B32B37/14; C23C14/06; G02B1/00; G02B5/00
Domestic Patent References:
| JP2011053715A | ||||
| JP2003059130A | ||||
| JP2002280384A |
Foreign References:
| WO2007083833A1 |
Attorney, Agent or Firm:
Nobuhiro Noguchi
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