Title:
マイクロリソグラフィ投影露光装置の光学系
Document Type and Number:
Japanese Patent JP6715241
Kind Code:
B2
Abstract:
An optical system of a microlithographic projection exposure apparatus designed for an operating wavelength of at least 150 nm. In one disclosed aspect, the optical system includes an element (11, 21) producing an angular distribution for light incident during the operation of the optical system and a fly's eye condenser (200, 400, 500) which includes two arrangements (210, 220, 410, 420, 510, 520) following one another in the light propagation direction and made of beam-deflecting optical elements (211-213, 221-223, 411-413, 421-423, 511-513, 521-523), which produce a multiplicity of optical channels. No optical element with refractive power is arranged in the beam path between the element (11, 21) producing an angular distribution and the fly's eye condenser (200, 400, 500).
Inventors:
Degunter Marx
Kolb Thomas
Kolb Thomas
Application Number:
JP2017516038A
Publication Date:
July 01, 2020
Filing Date:
May 22, 2015
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
G03F7/20; G02B19/00
Domestic Patent References:
| JP2009527113A | ||||
| JP2009527112A | ||||
| JP6310396A | ||||
| JP2008227497A | ||||
| JP2010048903A | ||||
| JP2002520810A |
Foreign References:
| US6583937 | ||||
| DE102009032939A1 | ||||
| WO2014063719A1 |
Attorney, Agent or Firm:
Takaki Nishijima
Disciple Maru Ken
Shinichiro Tanaka
Fumiaki Otsuka
Hiroyuki Suda
Naoki Kondo
Yoshinori Kishi
Disciple Maru Ken
Shinichiro Tanaka
Fumiaki Otsuka
Hiroyuki Suda
Naoki Kondo
Yoshinori Kishi