Title:
イオンビーム照射装置及び基板処理装置
Document Type and Number:
Japanese Patent JP6721486
Kind Code:
B2
Abstract:
Disclosed is an ion beam irradiation apparatus including: a plurality of plate-like grid electrodes arranged in a beam irradiation direction so as to overlap each other and each having a plurality of apertures; a power supply unit that applies a voltage to each of the grid electrodes; and a controller that controls the voltage applied to each of the grid electrodes by the power supply unit. The plurality of grid electrodes include first to fourth grid electrodes. Central axes of apertures of the first grid electrode and apertures of the second grid electrode are coaxial along the beam irradiation direction, and a central axis of apertures of the third grid electrode is offset in a direction orthogonal to the beam irradiation direction with respect to the central axes of the apertures of the first grid electrode and the second grid electrode.
Inventors:
Umezawa Yoshihiro
Ohata
Shinji Nagamachi
Kenichi Shimono
Ohata
Shinji Nagamachi
Kenichi Shimono
Application Number:
JP2016204174A
Publication Date:
July 15, 2020
Filing Date:
October 18, 2016
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H01J37/04; H01J27/16; H01J37/08; H01J37/305
Domestic Patent References:
JP9129150A | ||||
JP2236933A | ||||
JP2009217980A | ||||
JP2013505575A | ||||
JP2011253775A | ||||
JP2009507352A |
Foreign References:
US20120080609 | ||||
US20090256075 | ||||
US20110068276 |
Attorney, Agent or Firm:
Yoshiki Hasegawa
Yoshiki Kuroki
Junji Kashiwaoka
Omori Tetsuhei
Yoshiki Kuroki
Junji Kashiwaoka
Omori Tetsuhei