Title:
位置センサ、リソグラフィ装置およびデバイス製造方法
Document Type and Number:
Japanese Patent JP6744986
Kind Code:
B2
Abstract:
An alignment sensor for a lithographic apparatus has an optical system configured to deliver, collect and process radiation selectively in a first waveband (e.g. 500-900 nm) and/or in a second waveband (e.g. 1500-2500 nm). The radiation of the first and second wavebands share a common optical path in at least some portion of the optical system, while the radiation of the first waveband is processed by a first processing sub-system and the radiation of the second waveband is processed by a second processing sub-system. The processing subsystems in one example include self-referencing interferometers. The radiation of the second waveband allows marks to be measured through an opaque layer. Optical coatings and other components of each processing sub-system can be tailored to the respective waveband, without completely duplicating the optical system.
Inventors:
Houseman, Simon, Reinard
Matteisen, Simon, Geisbert, Josephus
Gordon, Sebastian, Adrienne
Akbrut, Doug
Polo, Alessandro
Matteisen, Simon, Geisbert, Josephus
Gordon, Sebastian, Adrienne
Akbrut, Doug
Polo, Alessandro
Application Number:
JP2019511875A
Publication Date:
August 19, 2020
Filing Date:
June 30, 2017
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
G03F9/00; G01B11/00
Domestic Patent References:
| JP2011040549A | ||||
| JP62291919A | ||||
| JP2001267196A | ||||
| JP2005268237A | ||||
| JP2010183075A |
Foreign References:
| WO2015051970A1 | ||||
| US20150355554 | ||||
| CN103365122A |
Attorney, Agent or Firm:
Sakaki Morishita
Takeshi Aoki
Takeshi Aoki