Title:
レーザ生成プラズマ極端紫外線光源のターゲット
Document Type and Number:
Japanese Patent JP6799645
Kind Code:
B2
Abstract:
Techniques for generating EUV light include directing a first pulse of radiation toward a target material droplet to form a modified droplet, the first pulse of radiation having an energy sufficient to alter a shape of the target material droplet; directing a second pulse of radiation toward the modified droplet to form an absorption material, the second pulse of radiation having an energy sufficient to change a property of the modified droplet, the property being related to absorption of radiation; and directing an amplified light beam toward the absorption material, the amplified light beam having an energy sufficient to convert at least a portion of the absorption material into extreme ultraviolet (EUV) light.
Inventors:
La fuck, robert jay
Tao, Jeong
Tao, Jeong
Application Number:
JP2019136363A
Publication Date:
December 16, 2020
Filing Date:
July 24, 2019
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
G03F7/20; H01S3/00; H05G2/00; H05H1/24
Domestic Patent References:
| JP2013004258A | ||||
| JP2011082473A | ||||
| JP2006303461A | ||||
| JP6563563B2 | ||||
| JP6397884B2 |
Foreign References:
| WO2013029906A1 |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito