Title:
構造物
Document Type and Number:
Japanese Patent JP6834881
Kind Code:
B2
Abstract:
The objective of the present invention is to provide a structure which can increase plasma resistance. The structure is based on a polycrystal of yttrium oxyfluoride having an orthorhombic crystal structure, and an average crystallite size thereof is less than 100 nm in the polycrystal. Provided is the structure having a peak intensity ratio (γ / δ) which is more than or equal to 0% and less than or equal to 150% when a peak intensity detected around a diffraction angle 2θ of 32.0° by x-ray diffraction is γ, and a peak intensity detected around a diffraction angle 2θ of 32.8° is δ.
Inventors:
Hiroaki Ashizawa
Kiyohara Masakatsu
Kiyohara Masakatsu
Application Number:
JP2017182304A
Publication Date:
February 24, 2021
Filing Date:
September 22, 2017
Export Citation:
Assignee:
TOTO Ltd.
International Classes:
H01L21/3065; C01F17/00; C23C4/04
Foreign References:
| KR1020110118939A | ||||
| WO2016129457A1 |
Attorney, Agent or Firm:
Masahiko Hinataji