Title:
スパッタリング用フッ素系高分子複合ターゲット
Document Type and Number:
Japanese Patent JP6877347
Kind Code:
B2
Abstract:
The fluoro-based polymer composite target for sputtering according to the present invention is excellent in adhesion with a metal electrode to which a voltage is applied, can prevent bending, and is capable of stably forming plasma by imparting conductivity even with industrially widely used DC and MF power supply systems, thereby allowing a fluorinated polymer to be effectively deposited on an adherend by sputtering.
Inventors:
Issan Jin
Jehun
Chojin
Kim Chul Fan
Kim Seung Hyun
Cho Sung Gun
Ham Dong Suk
Kim Kwang Jae
Park Dong Sun
Park Jae Sung
Jehun
Chojin
Kim Chul Fan
Kim Seung Hyun
Cho Sung Gun
Ham Dong Suk
Kim Kwang Jae
Park Dong Sun
Park Jae Sung
Application Number:
JP2017539574A
Publication Date:
May 26, 2021
Filing Date:
January 28, 2016
Export Citation:
Assignee:
KOREA GAS CORPORATION
International Classes:
C23C14/34; C03C17/28; H01L21/203; H01L21/312
Domestic Patent References:
| JP4145225A | ||||
| JP8101301A | ||||
| JP60107814A |
Attorney, Agent or Firm:
Masayuki Masabayashi
Hayashi Ichiyoshi
Tetsuo Shiba
Iwaike Mitsuru
Hayashi Ichiyoshi
Tetsuo Shiba
Iwaike Mitsuru