Title:
排気プレート及びプラズマ処理装置
Document Type and Number:
Japanese Patent JP6906377
Kind Code:
B2
Abstract:
A gas exhaust plate capable of improving a confinement effect of plasma while achieving sufficient conductance is provided. The gas exhaust plate is provided between a sidewall of a processing vessel of a plasma processing apparatus and a mounting table provided within the processing vessel, and is configured to separate a processing space in which a processing is performed by a plasmarized gas from a gas exhaust space which is adjacent to the processing space and through which a gas generated by the processing is exhausted. The gas exhaust plate includes a porous metal sheet.
Inventors:
Shinji Himori
Atsushi Abe
Atsushi Abe
Application Number:
JP2017123656A
Publication Date:
July 21, 2021
Filing Date:
June 23, 2017
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H05H1/46; C23C16/455; H01L21/3065
Domestic Patent References:
| JP2004140379A | ||||
| JP2002203843A | ||||
| JP10321605A | ||||
| JP2012204650A | ||||
| JP11214195A | ||||
| JP2011040461A | ||||
| JP2003332326A | ||||
| JP2012038761A | ||||
| JP2010223213A |
Attorney, Agent or Firm:
Tadashige Ito
Tadahiko Ito
Tadahiko Ito