Title:
収差補正装置および電子顕微鏡
Document Type and Number:
Japanese Patent JP6943779
Kind Code:
B2
Abstract:
An aberration corrector (10) for an electron microscope includes a geometric aberration corrector (200) provided with a transfer lens system disposed between the optical systems for geometric aberration correction (210, 220), wherein the transfer lens system includes an optical system for chromatic aberration correction (100), the optical system for chromatic aberration correction (100) has a first portion (110a), a second portion (110b), and a third portion (110c) disposed along an optical axis, and each of the first portion (100a), the second portion (110b), and the third portion (110c) has a thickness in a direction along the optical axis and generates an electromagnetic field having two-fold symmetry in which an electric field having two-fold symmetry and a magnetic field having two-fold symmetry are superimposed.
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Inventors:
Sawada Hidetaka
Application Number:
JP2018009999A
Publication Date:
October 06, 2021
Filing Date:
January 24, 2018
Export Citation:
Assignee:
JEOL Ltd.
International Classes:
H01J37/153
Domestic Patent References:
| JP2010114068A | ||||
| JP2011243409A | ||||
| JP2012160454A | ||||
| JP2013030374A | ||||
| JP2014116219A |
Foreign References:
| US20140158901 |
Attorney, Agent or Firm:
Yukio Fuse
Mitsue Obuchi
Mitsue Obuchi