Title:
光造形用樹脂組成物
Document Type and Number:
Japanese Patent JP6953542
Kind Code:
B2
Abstract:
The present invention provides a resin composition for stereolithography that, with its low consistency, enables easy fabrication while ensuring good shape accuracy and desirable color masking properties in the cured product. The present invention relates to a resin composition for stereolithography comprising: an 80 to 99 mass% polymerizable monomer (a); a 0.1 to 10 mass% photopolymerization initiator (b); a 0.1 to 5.0 mass% inorganic particle (c) having an average particle diameter of 5 to 200 nm; and a 0.01 to 10 mass% metal oxide particle (d) having an average particle diameter of 0.1 to 10 µm, the inorganic particle (c) being different from the metal oxide particle (d).
Inventors:
Kenji Suzuki
Application Number:
JP2019548224A
Publication Date:
October 27, 2021
Filing Date:
October 10, 2018
Export Citation:
Assignee:
Kuraray Noritake Dental Co., Ltd.
International Classes:
C08F2/44; A61K6/62; A61K6/70; A61K6/887; B29C64/135; B33Y10/00; B33Y70/00; B33Y80/00
Domestic Patent References:
| JP2017160355A | ||||
| JP2015043793A | ||||
| JP2016525150A | ||||
| JP10030002A |
Attorney, Agent or Firm:
Koichi Kamata
Tamura Yasuaki
Tamura Yasuaki