Title:
光造形用樹脂組成物
Document Type and Number:
Japanese Patent JP7352627
Kind Code:
B2
Abstract:
The present invention provides a resin composition for stereolithography emitting a weak odor, enabling easy fabrication of an object, and made into a cured product having desirable toughness and water resistance when used for stereolithographical fabrication. The present invention relates to a resin composition for stereolithography, comprising: an α,β-unsaturated double bond group-containing compound (A) having a homopolymer glass transition temperature (Tg) of 40°C or more, having a plurality of independent aromatic rings, and having no urethane bond; an α,β-unsaturated double bond group-containing compound (B) having a homopolymer glass transition temperature (Tg) of less than 40°C, having a ring structure, and having a normal boiling point of 250°C or more; and a photopolymerization initiator (C).
Inventors:
Misaki Ito
Kenji Suzuki
Kenji Suzuki
Application Number:
JP2021524943A
Publication Date:
September 28, 2023
Filing Date:
June 05, 2020
Export Citation:
Assignee:
Kuraray Noritake Dental Co., Ltd.
International Classes:
C08F290/06; A61K6/887; B29C64/106; B33Y70/00; C08F220/18; C08F220/30
Domestic Patent References:
| JP2016020474A | ||||
| JP2016102208A | ||||
| JP2017141381A |
Foreign References:
| WO2018143303A1 | ||||
| WO2018181832A1 | ||||
| WO2016199611A1 | ||||
| WO2019189566A1 |
Attorney, Agent or Firm:
Koichi Kamada
Yasuaki Tamura
Yasuaki Tamura