Title:
ブランクマスク用基板の洗浄方法、ブランクマスク用基板及びそれを含むブランクマスク
Document Type and Number:
Japanese Patent JP7407871
Kind Code:
B2
Abstract:
A method of cleaning a substrate for a blank mask including: a first cleaning including irradiating a cleaning target substrate with a pre-treatment light to prepare a substrate cleaned with light, and a second cleaning including applying a first cleaning solution and a post-treatment light to the substrate cleaned with light to prepare the substrate for the blank mask, is disclosed.
Inventors:
Kim, Tewan
I, Gon Gon
Choi, Sukyoung
Kim, Soo Hyun
Sung, Sung Hoon
Kim, Seong Yoon
John, Mingyo
Cho, Hahyun
Shin, Inkyun
Lee, Hyunjoo
I, Gon Gon
Choi, Sukyoung
Kim, Soo Hyun
Sung, Sung Hoon
Kim, Seong Yoon
John, Mingyo
Cho, Hahyun
Shin, Inkyun
Lee, Hyunjoo
Application Number:
JP2022106615A
Publication Date:
January 04, 2024
Filing Date:
June 30, 2022
Export Citation:
Assignee:
SK enpulse Co.,Ltd.
International Classes:
G03F1/82; G03F1/60; H01L21/304
Domestic Patent References:
| JP2000015196A | ||||
| JP2001293443A | ||||
| JP2004356403A | ||||
| JP2008051880A | ||||
| JP2015022150A |
Attorney, Agent or Firm:
SK Patent Attorney Corporation
Akihiko Okuno
Hiroyuki Ito
Akihiko Okuno
Hiroyuki Ito