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Title:
【発明の名称】支持体上の発光物質層の製造法
Document Type and Number:
Japanese Patent JPH06509314
Kind Code:
A
Abstract:
PCT No. PCT/DE92/00534 Sec. 371 Date Dec. 15, 1993 Sec. 102(e) Date Dec. 15, 1993 PCT Filed Jun. 29, 1992 PCT Pub. No. WO93/02982 PCT Pub. Date Feb. 18, 1993.A doped starting substance is applied to a substrate composed of SiO2 glass. A phosphor layer is formed by reaction of the starting substance with SiO2 of the substrate to form a silicate of the starting substance. This reaction is carried out in a heat-treatment process in an oxygen-containing atmosphere. Zn or Gd is preferably used as starting substance.

Inventors:
Grab Meier, Crysta
Bertholt, Thomas
Application Number:
JP50316093A
Publication Date:
October 20, 1994
Filing Date:
June 29, 1992
Export Citation:
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Assignee:
Siemens Aktiengesellschaft
International Classes:
C03C17/23; C03C23/00; C03C25/10; C03C25/42; C09K11/00; C09K11/57; C09K11/59; C09K11/74; C09K11/77; C09K11/78; C09K11/79; G21K4/00; H01J9/22; (IPC1-7): C03C17/23; C03C23/00; C03C25/02; C09K11/00; C09K11/59; C09K11/74; C09K11/79; H01J9/22
Attorney, Agent or Firm:
Toshio Yano (3 outside)



 
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