Document Type and Number:
Japanese Patent JPWO2020202968
Kind Code:
A1
Abstract:
Provided is a method for producing a fine conductive pattern having an excellent conductivity even at a low temperature of 100°C or less. Provided is a method for producing a conductive pattern, the method including: (1) a step for forming, on a substrate, a pattern that contains conductive particles (a), a resin (b), a zwitterionic compound (c1), and/or a quaternary ammonium salt compound (c2); and (2) a step for bringing an acidic aqueous solution having a pH of 1.2-3.5 at 25°C into contact with the formed pattern.
Application Number:
JP2020513350A
Publication Date:
October 08, 2020
Filing Date:
March 02, 2020
Export Citation:
Domestic Patent References:
| JP2008277250A | 2008-11-13 | |||
| JPH0212236A | 1990-01-17 | |||
| JPH02103536A | 1990-04-16 | |||
| JP2013196918A | 2013-09-30 |
Foreign References:
| WO2013002195A1 | 2013-01-03 |