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Patent Searching and Data


Document Type and Number:
Japanese Patent JPWO2023119549
Kind Code:
A1
Abstract:
Colloidal silica containing water and silica particles, said colloidal silica being characterized in that the relative relaxation rate as measured by pulsed NMR at a silica particle concentration of 3 mass% is 0.60 or greater, and the zeta potential of the silica particle surfaces in the pH range of 2 to 5 is -10 to 10 mv.

Application Number:
JP2021577184A
Publication Date:
June 29, 2023
Filing Date:
December 23, 2021
Export Citation:
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