ALICYCLIC UNSATURATED COMPOUND, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND METHOD FOR FORMING PATTERN USING SAID COMPOSITION

Title:

ALICYCLIC UNSATURATED COMPOUND, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND METHOD FOR FORMING PATTERN USING SAID COMPOSITION

Document Type and Number:

WIPO Patent Application WO/2004/078688

Kind Code:

A1

Abstract:

A novel alicyclic unsaturated compound represented by the general formula (1): wherein at least one of R¹ and R² is a fluorine atom or a fluorinated alkyl group; a polymer formed by the polymerization of a polymer precursor comprising the alicyclic unsaturated compound. The polymer is useful, in the lithography using a light having a wavelength of 190 nm or less, as a chemically amplified resist which exhibits excellent transparency with respect to the light for use in exposure and also is excellent in the adhesion to a substrate and the resistance to dry etching.

Inventors:

MAEDA KATSUMI (JP)
NAKANO KAICHIRO (JP)

Application Number:

PCT/JP2004/002728

Publication Date:

September 16, 2004

Filing Date:

March 04, 2004

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Assignee:

NEC CORP (JP)
MAEDA KATSUMI (JP)
NAKANO KAICHIRO (JP)

International Classes:

C07C35/52; G03F7/004; G03F7/039; (IPC1-7): C07C35/52; C07C43/178; C07C43/196; C07C69/65; C08F32/08; G03F7/039

Domestic Patent References:

WO2002079287A1

2002-10-10

Foreign References:

JP2002072484A

2002-03-12

Attorney, Agent or Firm:

Miyazaki, Teruo (16th Kowa Bldg. 9-20, Akasaka 1-chome, Minato-k, Tokyo 52, JP)

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