To provide a new acid-producing agent which is suitable as a radiation-sensitive acid-producing agent or thermally acid-producing agent, has relatively high combustibility, does not have a problem on accumulativeness in human bodies, produces an acid having sufficiently high acidity and boiling point, has a suitably short diffusion length in a resist coating film, and hardly has mask pattern dependency, to provide positive and negative type radiation-sensitive resin compositions containing the acid-producing agent, and the like.
This acid-producing agent comprises a compound having a structure represented by formula (I) (R is a monovalent organic group having a fluorine content of ≤50 wt. %, nitro group, cyano group, or H; Z1 and Z2 are each F or a perfluoroalkyl group). The positive type radiation-sensitive resin composition comprises the above-described acid-producing agent, and an acid-dissociating group-containing resin or an alkali-soluble resin and an alkali solubility controller. The negative type radiation-sensitive resin composition comprises the above-described acid-producing agent, an alkali-soluble resin and a cross-linking agent.
YONEDA EIJI
NAGAI TOMOKI
TONERI TATSUYA
O ISAMU
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