Title:
感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法、及び電子デバイスの製造方法
Document Type and Number:
Japanese Patent JP7344956
Kind Code:
B2
Abstract:
Provided is an active light-sensitive or radiation-sensitive resin composition, etc., that is capable of forming a pattern having an extremely excellent rectangular shape in the cross-section thereof, when forming a pattern having an extremely high cross-section aspect ratio from a thick active light-sensitive radiation-sensitive film. This active light-sensitive or radiation-sensitive resin composition includes: a resin (A) having increased polarity due to the use of acid; a compound (B) generating acid as a result of irradiation by active light or radiation; and a compound (C) indicated by a specific structure and having a molecular weight of at least 220.
Inventors:
Naoya Hatakeyama
Yasutomo Yonekuda
Keimitsu Tomiga
Kohei Higashi
Yasutomo Yonekuda
Keimitsu Tomiga
Kohei Higashi
Application Number:
JP2021511246A
Publication Date:
September 14, 2023
Filing Date:
February 28, 2020
Export Citation:
Assignee:
Fujifilm Corporation
International Classes:
G03F7/004; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| JP2013068776A | ||||
| JP2013250329A | ||||
| JP2011057663A | ||||
| JP2012072062A | ||||
| JP2014235432A |
Attorney, Agent or Firm:
Patent Attorney Corporation Koei Office