Title:
感活性光線性又は感放射線性樹脂組成物、パターン形成方法、レジスト膜、電子デバイスの製造方法、化合物、化合物の製造方法
Document Type and Number:
Japanese Patent JP7382503
Kind Code:
B2
Abstract:
The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition with which a pattern having excellent LWR performance can be obtained, a resist film, a pattern forming method, a method for manufacturing an electronic device, a compound, and a method for producing the compound. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention is an actinic ray-sensitive or radiation-sensitive resin composition including a resin having a repeating unit having a group having a polarity that increases through decomposition by the action of an acid, in which the actinic ray-sensitive or radiation-sensitive resin composition further includes, in addition to the resin, a compound having at least one cation represented by General Formula (1), or the resin further has, in addition to the repeating unit, a repeating unit having the cation represented by General Formula (1).
Inventors:
Kenyoshi Goto
▲高▼田 暁
Mana Ushiyama
Masashi Kojima
Michihiro Shirakawa
▲高▼田 暁
Mana Ushiyama
Masashi Kojima
Michihiro Shirakawa
Application Number:
JP2022527592A
Publication Date:
November 16, 2023
Filing Date:
April 21, 2021
Export Citation:
Assignee:
Fujifilm Corporation
International Classes:
G03F7/039; C07C303/22; C07C309/06; C07C309/17; C07C381/12; G03F7/004; G03F7/038; G03F7/20
Domestic Patent References:
| JP2011114822A | ||||
| JP2000034274A |
Attorney, Agent or Firm:
Hideaki Ito
Fumio Mihashi
Fumio Mihashi