Title:
ADSORBENT FOR PURIFYING CHEMICAL SOLUTION AND ITS PREPARATION
Document Type and Number:
Japanese Patent JP2500732
Kind Code:
B2
Abstract:
PURPOSE: To obtain an adsorbent used in the purification of a hydrofluoric acid-containing chemical soln. to enable purification of a high purity level usable in the manufacturing process of a semiconductor device.
CONSTITUTION: A dilute hydrofluoric acid soln. 3 containing a metal (gold or silver) to be precipitated is received in the reaction container 2 on a magnetic stirrer 1 and silicon particles 4 are added to the soln. 3 and stirred for a predetermined time by a stirrer 5 to precipitate the metal, and, thereafter, the metal supported particles are sufficiently washed with pure water to prepare an adsorbent.
Inventors:
YAMAMOTO KENICHI
SHIMONO TSUGIO
SHIMONO TSUGIO
Application Number:
JP874093A
Publication Date:
May 29, 1996
Filing Date:
January 22, 1993
Export Citation:
Assignee:
NIPPON ELECTRIC CO
International Classes:
B01J20/02; B01J20/10; H01L21/304; H01L21/308; (IPC1-7): B01J20/10; H01L21/304; H01L21/308
Domestic Patent References:
| JP57165032A |
Attorney, Agent or Firm:
Naoki Kyomoto (2 outside)