Title:
【発明の名称】炭素膜形成方法と磁気メモリ構造と磁気ディスク製造方法
Document Type and Number:
Japanese Patent JP3157006
Kind Code:
B2
Abstract:
A carbon film for protecting a magnetic disk is sputtered in the presence of hydrogen. If a sufficient amount of hydrogen is present in the sputtering chamber (5), the resulting carbon film will exhibit superior mechanical characteristics, i.e. an enhanced wear resistance during a contact-start-stop or drag test in a disk drive. Sputtering in the presence of hydrogen can be accomplished by either DC or RF magnetron sputtering, or DC or RF diode sputtering.
Inventors:
Tsutomu Tom Yamashita
Application Number:
JP3234591A
Publication Date:
April 16, 2001
Filing Date:
February 01, 1991
Export Citation:
Assignee:
KOMAG,INCORPORATED
International Classes:
G11B5/851; G11B5/84; (IPC1-7): G11B5/851
Domestic Patent References:
| JP63313318A |
Attorney, Agent or Firm:
Yoichi Oshima (1 outside)